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Search / Korean Journal of Chemical Engineering
Total 1 articles [ 키워드: Gate Etch ]
No. Article
1 Korean Chemical Engineering Research, 47 (1), pp.79-83 (2009)
Cl2/HBr/O2 고밀도 플라즈마에서 비정질 실리콘 게이트 식각공정 특성
Characteristics of Amorphous Silicon Gate Etching in Cl2/HBr/O2 High Density Plasma
이원규