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Search / Korean Journal of Chemical Engineering
Total 21 articles [ 키워드: AFI ]
No. Article
21 HWAHAK KONGHAK, 34 (2), pp.243-248 (1996)
간략화된 MCVD 반응기에서의 초미립 SiO2 입자 증착특성
Deposition Characteristics of Ultrafine SiO2 Particles in Simplified MCVD Reactor
현봉수, 김교선
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