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Search / Korean Journal of Chemical Engineering
Total 1 articles [ 저자: 이형재 ]
No. Article
1 HWAHAK KONGHAK, 35 (4), pp.504-513 (1997)
HF-산화제-H2O 수용액에서 Si 식각반응의 속도론적 연구
A Study on Kinetics of Silicon Etching Reaction in HF-Oxidizing Agents-H2O Solutions
서영훈, 김선중, 김광철, et al.