Korean Chem. Eng. Res.
Print:
ISSN 0304-128X
Online:
ISSN 2233-9558
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Search / Korean Journal of Chemical Engineering
Total
1
articles [
저자
:
윤민희
]
No.
Article
1
HWAHAK KONGHAK
,
31
(3), pp.255-262 (1993)
ECR plasma 식각장치에서 CF
4
에 의한 Si의 식각반응에 관한 연구
The etching reaction of silicon with CF
4
in ECR plasma etching system
윤민희
, 김종배, 남기석, et al.
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