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Issue
Korean Chemical Engineering Research,
Vol.55, No.2, 214-219, 2017
SNIPS 공정을 이용한 블록공중합체 분리막의 구조 형성에 관한 연구
Fabrication of Block Copolymer Membranes via SNIPS Process
우상훈, 김진희, 이정현, 방준하
본 연구에서는 블록공중합체의 자기조립(Self-assembly) 성질과 상전이를 통한 비대칭의 다공성 구조를 형성하는 NIPS 기술을 결합한 SNIPS (Self-assembly and non-solvent induced phase separation) 공정을 이용하여 PS-b-P4VP 블록공중합체 분리막을 제조하였다. 기존의 연구는 단순히 원하는 구조 구현에만 집중되었고 SNIPS 공정상의 내재 변수(농도, 증발시간, 용매의 조성, 습도)들에 대한 체계적인 연구는 보고되지 않았다. 본 연구에서는 PS-b-P4VP 와 DMF, 1,4-Dioxane, THF, DI를 이용해 내재 변수의 영향을 정성적으로 분석하였다. 그 결과, 용액의 농도와 휘발성 용매의 비율이 적당하고 습도가 낮은 환경에서 모폴로지가 최적화 되었으며, PS-b-P4VP 분리막은 표면에 잘 구현된 실린더 구조가 형성되었고 75%의 높은 기공도와 약 18%의 표면 기공도를 가지는 것을 확인하였다.
In this work, we fabricated PS-b-P4VP block copolymer membranes from self-assembly and non-solvent induced phase separation (SNIPS), which combines the block copolymer self-assembly and conventional NIPS process. While previous studies mostly focused on the fabrication of well-defined structures, we systematically examined various processing parameters such as polymer concentration, solvent evaporation duration, solvent composition, and humidity, to optimized the membrane structures. As a result, the morphology of PS-b-P4VP membranes was optimized at a certain polymer concentration in solution and composition of volatile solvent at low humidity conditions, resulting in SNIPS separation membranes with well-defined nanopores on the surface, 75% of membrane porosity, and 18% of surface porosity.
Keywords: PS-b-P4VP; SNIPS; Block copolymer membrane; Relative humidity
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