Korean Chem. Eng. Res.
Print:
ISSN 0304-128X
Online:
ISSN 2233-9558
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Issue
Total
2
articles [
키워드
:
Dry Etching
]
No.
Article
1
Korean Chemical Engineering Research
,
46
(4), pp.676-680 (2008)
rf 마그네트론 스퍼링에 의하여 증착된 TiN 박막의 물성에 대한 증착변수의 영향
Effect of Deposition Parameters on the Properties of TiN Thin Films Deposited by rf Magnetron Sputtering
이도영, 정지원
2
Korean Chemical Engineering Research
,
42
(6), pp.712-715 (2004)
Hard Mask 용 SiO
2
의 NF
3
/Ar ICP 식각특성과 실험계획법과의 비교
Dry Etching of SiO
2
Hard Mask in NF3/Ar Inductively Coupled Plasmas and Comparison with Design of Experiments
박형조, 라현욱, 남기석, et al.
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